For gas flow control at your vacuum system, a comfortable and clearly arranged control device is required?
Do you use different gases and gas mixtures for your processes? Therefore you are looking for a convenient and reliable solution, sustaining mixture ratios of process gases while changing the volume flow?
By using our four-channel flow controller FCU-4 from our product series JEVAflow®, a versatile and technical equivalent to the ROD-4 from Hitachi Metals control device, developed by JEVATEC GmbH, awaits you. On request, we are offering a suitable MFC for your application.
■ control unit for up to four analog or digital MFCs
■ clearly legible 4-digit LED display and status display for every channel
■ display and entering of the flow values in % within the measuring range or in slm/sccm
■ controlling via front keybord or serial interface RS 232
■ Master/Slave function
■ One analog output per channel
■ Two relays per channel for process controlling as well as valve controlling
■ Wide-range power supply for worldwide operation
■ Rack slot 19”, 2 height units
Did we spark your interest?
Get in contact with us. We are looking forward to answer your questions or make you an offer.